Abstract
Improvements in the manufacture of multicrystalline silicon (mc-Si) and processing induced impurity gettering have enabled the demonstration of diffusion lengths in mc-Si much greater than the substrate thickness. High recombination velocities at the rear surface, rather than bulk recombination, can then limit cell efficiency. The traditional n+/p/p+ cell structure (produced with aluminum alloying) is therefore less suitable for high lifetime material due to high effective rear surface recombination velocities. Rear surface recombination can be reduced by reducing the rear metal contact area and passivating most of the rear with thermal oxides. Record open circuit voltages (654 mV) and high efficiencies (18.2%) are demonstrated with 4 cm2 cells on 0.5 Ωcm Eurosil substrates. Cells with local boron diffusions under the rear contacts also demonstrate high efficiencies.
Original language | English |
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Pages (from-to) | 67-70 |
Number of pages | 4 |
Journal | Conference Record of the IEEE Photovoltaic Specialists Conference |
Publication status | Published - 1997 |
Event | Proceedings of the 1997 IEEE 26th Photovoltaic Specialists Conference - Anaheim, CA, USA Duration: 29 Sept 1997 → 3 Oct 1997 |