N-type multicrystalline silicon: A stable, high lifetime material

A. Cuevas*, S. Riepe, M. J. Kerr, D. H. Macdonald, G. Coletti, F. Ferrazza

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    7 Citations (Scopus)

    Abstract

    An investigation of n-type multicrystalline silicon grown by directional solidification has produced several important findings: i) demonstration of effective phosphorus gettering; ii) achievement of minority carrier lifetimes above one millisecond; iii) verification of good stability under illumination. The lifetimes after gettering show a strong dependence on doping: 1.6ms for 2.3Ωcm, 500μs for 0.9Ωcm and 100μs for 0.36Ωcm, respectively. Lifetime mapping by infrared carrier density imaging has revealed a large surface variability of this parameter, which is detrimental for large area devices. A minor degradation of the lifetime after light exposure has been observed for the highest lifetime regions, while other wafers and regions remained essentially stable.

    Original languageEnglish
    Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
    EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
    Pages1312-1315
    Number of pages4
    Publication statusPublished - 2003
    EventProceddings of the 3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
    Duration: 11 May 200318 May 2003

    Publication series

    NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
    VolumeB

    Conference

    ConferenceProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
    Country/TerritoryJapan
    CityOsaka
    Period11/05/0318/05/03

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