N-type polysilicon passivating contacts using ultra-thin PECVD silicon oxynitrides as the interfacial layer
- Wenhao Chen*
- , Josua Stuckelberger
- , Wenjie Wang
- , Sieu Pheng Phang
- , Daniel Macdonald
- , Yimao Wan
- , Di Yan*
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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Citations
(Scopus)