TY - JOUR
T1 - Nano- and microstructuring of graphene using UV-NIL
AU - Bergmair, Iris
AU - Hackl, Wolfgang
AU - Losurdo, Maria
AU - Helgert, Christian
AU - Isic, Goran
AU - Rohn, Michael
AU - Jakovljevic, Milka M.
AU - Mueller, Thomas
AU - Giangregorio, Maria
AU - Kley, Ernst Bernhard
AU - Fromherz, Thomas
AU - Gajic, Rados
AU - Pertsch, Thomas
AU - Bruno, Giovanni
AU - Muehlberger, Michael
PY - 2012/8/24
Y1 - 2012/8/24
N2 - In this work we demonstrate for the first time the micro-and nanostructuring of graphene by means of UV-nanoimprint lithography. Exfoliated graphene on SiO 2 substrates, as well as graphene deposited by chemical vapor deposition (CVD) on polycrystalline nickel and copper, and transferred CVD graphene on dielectric substrates, were used to demonstrate that our technique is suitable for large-area patterning (2×2cm 2) of graphene on various types of substrates. The demonstrated fabrication procedure of micrometer as well as nanometer-sized graphene structures with feature sizes down to 20nm by a wafer-scale process opens up an avenue for the low-cost and high-throughput manufacturing of graphene-based optical and electronic applications. The processed graphene films show electron mobilities of up to 4.6×10 3cm 2V 1s 1, which confirms them to exhibit state-of-the-art electronic quality with respect to the current literature.
AB - In this work we demonstrate for the first time the micro-and nanostructuring of graphene by means of UV-nanoimprint lithography. Exfoliated graphene on SiO 2 substrates, as well as graphene deposited by chemical vapor deposition (CVD) on polycrystalline nickel and copper, and transferred CVD graphene on dielectric substrates, were used to demonstrate that our technique is suitable for large-area patterning (2×2cm 2) of graphene on various types of substrates. The demonstrated fabrication procedure of micrometer as well as nanometer-sized graphene structures with feature sizes down to 20nm by a wafer-scale process opens up an avenue for the low-cost and high-throughput manufacturing of graphene-based optical and electronic applications. The processed graphene films show electron mobilities of up to 4.6×10 3cm 2V 1s 1, which confirms them to exhibit state-of-the-art electronic quality with respect to the current literature.
UR - http://www.scopus.com/inward/record.url?scp=84864607965&partnerID=8YFLogxK
U2 - 10.1088/0957-4484/23/33/335301
DO - 10.1088/0957-4484/23/33/335301
M3 - Article
SN - 0957-4484
VL - 23
JO - Nanotechnology
JF - Nanotechnology
IS - 33
M1 - 335301
ER -