Abstract
We demonstrate the fabrication of small core high index contrast Polysiloxane waveguides using Ultraviolet Nanoimprint Lithography for the first time, and report zero process induced excess loss at 1550nm in the finished devices. This technique was also explored for the single step fabrication of more complex devices, e.g., grating waveguide and 3dB couplers.
Original language | English |
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Pages | - |
DOIs | |
Publication status | Published - 2009 |
Event | Frontiers in Optics, FiO 2009 - San Jose, CA Duration: 1 Jan 2009 → … |
Conference
Conference | Frontiers in Optics, FiO 2009 |
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Period | 1/01/09 → … |
Other | 11 October 2009 through 15 October 2009 |