Nanoimprinted polysiloxane optical devices

Ting Han; Steve Madden; Ting Han; Barry Luther-Davies; Robbie Charters

doi:10.1364/FIO.2009.FThE5

Nanoimprinted polysiloxane optical devices

Ting Han, Steve Madden, Ting Han, Barry Luther-Davies, Robbie Charters

Research output: Contribution to conference › Paper › peer-review

Abstract

We demonstrate the fabrication of small core high index contrast Polysiloxane waveguides using Ultraviolet Nanoimprint Lithography for the first time, and report zero process induced excess loss at 1550nm in the finished devices. This technique was also explored for the single step fabrication of more complex devices, e.g., grating waveguide and 3dB couplers.

Original language	English
Pages	-
DOIs	https://doi.org/10.1364/FIO.2009.FThE5
Publication status	Published - 2009
Event	Frontiers in Optics, FiO 2009 - San Jose, CA Duration: 1 Jan 2009 → …

Conference

Conference	Frontiers in Optics, FiO 2009
Period	1/01/09 → …
Other	11 October 2009 through 15 October 2009

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10.1364/FIO.2009.FThE5

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title = "Nanoimprinted polysiloxane optical devices",

abstract = "We demonstrate the fabrication of small core high index contrast Polysiloxane waveguides using Ultraviolet Nanoimprint Lithography for the first time, and report zero process induced excess loss at 1550nm in the finished devices. This technique was also explored for the single step fabrication of more complex devices, e.g., grating waveguide and 3dB couplers.",

author = "Ting Han and Steve Madden and Ting Han and Barry Luther-Davies and Robbie Charters",

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doi = "10.1364/FIO.2009.FThE5",

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AU - Han, Ting

AU - Madden, Steve

AU - Han, Ting

AU - Luther-Davies, Barry

AU - Charters, Robbie

PY - 2009

Y1 - 2009

N2 - We demonstrate the fabrication of small core high index contrast Polysiloxane waveguides using Ultraviolet Nanoimprint Lithography for the first time, and report zero process induced excess loss at 1550nm in the finished devices. This technique was also explored for the single step fabrication of more complex devices, e.g., grating waveguide and 3dB couplers.

AB - We demonstrate the fabrication of small core high index contrast Polysiloxane waveguides using Ultraviolet Nanoimprint Lithography for the first time, and report zero process induced excess loss at 1550nm in the finished devices. This technique was also explored for the single step fabrication of more complex devices, e.g., grating waveguide and 3dB couplers.

U2 - 10.1364/FIO.2009.FThE5

DO - 10.1364/FIO.2009.FThE5

M3 - Paper

SP - -

T2 - Frontiers in Optics, FiO 2009

Y2 - 1 January 2009

ER -

Nanoimprinted polysiloxane optical devices

Abstract

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