Abstract
We report the fabrication and characterization of TiO 2 sol-gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25cm 2. Minority carrier lifetimes of up to 900μs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light-generated negative charge in the films. The structures reported here are very promising as light-trapping, passivating coatings for solar cells.
Original language | English |
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Pages (from-to) | 143-148 |
Number of pages | 6 |
Journal | Progress in Photovoltaics: Research and Applications |
Volume | 20 |
Issue number | 2 |
DOIs | |
Publication status | Published - Mar 2012 |