Nanoindentation of epitaxial GaN films

S. O. Kucheyev*, J. E. Bradby, J. S. Williams, C. Jagadish, M. Toth, M. R. Phillips, M. V. Swain

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    109 Citations (Scopus)

    Abstract

    Wurtzite GaN films grown on sapphire substrates are studied by nanoindentation with a spherical indenter. No systematic dependence of the mechanical properties of GaN epilayers on the film thickness (at least for thicknesses from 1.8 to 4 μm) as well as on doping type is observed. Slip is identified as one of the physical mechanisms responsible for plastic deformation of GaN and may also contribute to the "pop-in" events observed during loading. No visible material cracking is found even after indentations at high loads (900 mN), but a pronounced elevation of the material surrounding the impression is observed.

    Original languageEnglish
    Pages (from-to)3373-3375
    Number of pages3
    JournalApplied Physics Letters
    Volume77
    Issue number21
    DOIs
    Publication statusPublished - 20 Nov 2000

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