Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam

Daniel S. Fox, Yangbo Zhou, Pierce Maguire, Arlene Oneill, Cormac Ócoileaín, Riley Gatensby, Alexey M. Glushenkov, Tao Tao, Georg S. Duesberg, Igor V. Shvets, Mohamed Abid, Mourad Abid, Han Chun Wu, Ying Chen, Jonathan N. Coleman, John F. Donegan, Hongzhou Zhang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

183 Citations (Scopus)

Abstract

We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He+. Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.

Original languageEnglish
Pages (from-to)5307-5313
Number of pages7
JournalNano Letters
Volume15
Issue number8
DOIs
Publication statusPublished - 12 Aug 2015
Externally publishedYes

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