Abstract
Polarization effects in laser 3D nanolithography are employed to fine-tune the feature sizes in the structuring of photoresist. The vectorial Debye theory is used for modelling and a variation of up to ≈20% in the line width of SZ2080 is shown experimentally for the identical axial extent. This proves polarization to be a variable parameter for voxel-aspect ratio control.
Original language | English |
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Pages (from-to) | 1209-1214 |
Number of pages | 6 |
Journal | Advanced Optical Materials |
Volume | 4 |
Issue number | 8 |
DOIs | |
Publication status | Published - 1 Aug 2016 |