Abstract
Polarization effects in laser 3D nanolithography are employed to fine-tune the feature sizes in the structuring of photoresist. The vectorial Debye theory is used for modelling and a variation of up to ≈20% in the line width of SZ2080 is shown experimentally for the identical axial extent. This proves polarization to be a variable parameter for voxel-aspect ratio control.
| Original language | English |
|---|---|
| Pages (from-to) | 1209-1214 |
| Number of pages | 6 |
| Journal | Advanced Optical Materials |
| Volume | 4 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 1 Aug 2016 |