Numerical simulation and simple approximation of the impurity gettering kinetics by polysilicon based passivating contacts

Zhongshu Yang*, Josua Stuckelberger, Daniel Macdonald, AnYao Liu*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference Paperpeer-review

Abstract

This paper presents 1D and 3D numerical simulations of the diffusion-limited gettering process for iron in silicon by the polysilicon/oxide passivating contact structures. Simulation results reveal that a 1D model is sufficient to simulate the gettering kinetics, as iron diffusion through the oxide interlayer can take place via both direct diffusion and diffusion through pinholes, where either of these two are mainly 1D. In addition, we provide a simple exponential approximation to describe the gettering kinetics, which can be used to extract the blocking effect of the oxide interlayer in the cases where the Fe transport factor in oxide is less than 1×10-5.

Original languageEnglish
Title of host publication2022 IEEE 49th Photovoltaics Specialists Conference (PVSC), Philadelphia, PA, USA
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1429-1434
Number of pages6
ISBN (Electronic)978-1-7281-6117-4
ISBN (Print)978-1-7281-6118-1
DOIs
Publication statusPublished - 2022
Event49th IEEE Photovoltaics Specialists Conference, PVSC 2022 - Philadelphia, United States
Duration: 5 Jun 202210 Jun 2022
Conference number: 49
https://ieee-pvsc.org/PVSC49/
https://ieeexplore.ieee.org/xpl/conhome/9938432/proceeding (Conference Proceedings)

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISSN (Print)0160-8371

Conference

Conference49th IEEE Photovoltaics Specialists Conference, PVSC 2022
Country/TerritoryUnited States
CityPhiladelphia
Period5/06/2210/06/22
Internet address

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