Optimization and Characterization of Phosphorus Diffused LPCVD Polysilicon Passivated Contacts with Low Pressure Tunnel Oxide

Kean Chern Fong, Teng Choon Kho, Wensheng Liang, Teck Kong Chong, Marco Ernst, Daniel Walter, Matthew Stocks, Evan Franklin, Keith McIntosh, Andrew Blakers

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    3 Citations (Scopus)

    Abstract

    This work presents the investigation of low pressure in-situ thermal oxidation as the interfacial oxide for n+ polysilicon-oxide passivated contact structure, achieving excellent surface passivation below 1 fA·cm -2 and contact resistivity below 1 mΩ·cm 2 . The results from the process optimisation are presented in detail, showing the importance of accurate control of oxidation conditions, and presenting the correlation to the electrical properties. Additionally, a method of fabricating contact resistivity structures from symmetrical photoconductance decay lifetime samples, and the extraction of the specific contact resistivity using 3D numerical simulation is presented.

    Original languageEnglish
    Title of host publication2018 IEEE 7th World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - A Joint Conference of 45th IEEE PVSC, 28th PVSEC and 34th EU PVSEC
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages2002-2005
    Number of pages4
    ISBN (Electronic)9781538685297
    DOIs
    Publication statusPublished - 26 Nov 2018
    Event7th IEEE World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - Waikoloa Village, United States
    Duration: 10 Jun 201815 Jun 2018

    Publication series

    Name2018 IEEE 7th World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - A Joint Conference of 45th IEEE PVSC, 28th PVSEC and 34th EU PVSEC

    Conference

    Conference7th IEEE World Conference on Photovoltaic Energy Conversion, WCPEC 2018
    Country/TerritoryUnited States
    CityWaikoloa Village
    Period10/06/1815/06/18

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