Passivation of highly boron doped silicon surfaces by sputtered AlO x and PECVD SiN, a comparison
- T. T.A. Li
- , A. Cuevas
- , J. Tan
- , C. Samundsett
- , D. Saynova
- , B. Geerligs
Research output: Chapter in Book/Report/Conference proceeding › Conference Paper › peer-review
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(Scopus)