Phase change behaviors of Zn-doped Ge 2Sb 2Te 5 films

Guoxiang Wang*, Qiuhua Nie, Xiang Shen, R. P. Wang, Liangcai Wu, Jing Fu, Tiefeng Xu, Shixun Dai

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    77 Citations (Scopus)

    Abstract

    Zn-doped Ge 2Sb 2Te 5 phase-change materials have been investigated for phase change memory applications. Zn 15.16(Ge 2Sb 2Te 5) 84.84 phase change film exhibits a higher crystallization temperature (∼258 °C), wider band gap (∼0.78 eV), better data retention of 10 years at 167.5 °C, higher crystalline resistance, and faster crystallization speed compared with the conventional Ge 2Sb 2Te 5. The proper Zn atom added into Ge 2Sb 2Te 5 serves as a center for suppression of the face-centered-cubic (fcc) phase to hexagonal close-packed (hcp) phase transition, and fcc phase has high thermal stability partially due to the bond recombination among Zn, Sb, and Te atoms.

    Original languageEnglish
    Article number051906
    JournalApplied Physics Letters
    Volume101
    Issue number5
    DOIs
    Publication statusPublished - 30 Jul 2012

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