Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

Xuchu Zeng; Tat Kun Kwok; Aiguo Liu; Paul K. Chu; Baoyin Tang; Terrence E. Sheridan

doi:10.1109/27.669623

Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

Xuchu Zeng^*, Tat Kun Kwok, Aiguo Liu, Paul K. Chu, Baoyin Tang, Terrence E. Sheridan

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Plasma-immersion ion implantation (PHI) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson's equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time.

Original language	English
Pages (from-to)	175-180
Number of pages	6
Journal	IEEE Transactions on Plasma Science
Volume	26
Issue number	2
DOIs	https://doi.org/10.1109/27.669623
Publication status	Published - 1998

Access to Document

10.1109/27.669623

Cite this

@article{e8367125762941b4a5a7ecb1d0e7718f,

title = "Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses",

abstract = "Plasma-immersion ion implantation (PHI) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson's equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time.",

keywords = "Ion implantation, Plasma applications, Plasma sheath",

author = "Xuchu Zeng and Kwok, {Tat Kun} and Aiguo Liu and Chu, {Paul K.} and Baoyin Tang and Sheridan, {Terrence E.}",

year = "1998",

doi = "10.1109/27.669623",

language = "English",

volume = "26",

pages = "175--180",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "2",

}

TY - JOUR

T1 - Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

AU - Zeng, Xuchu

AU - Kwok, Tat Kun

AU - Liu, Aiguo

AU - Chu, Paul K.

AU - Tang, Baoyin

AU - Sheridan, Terrence E.

PY - 1998

Y1 - 1998

N2 - Plasma-immersion ion implantation (PHI) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson's equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time.

AB - Plasma-immersion ion implantation (PHI) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson's equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time.

KW - Ion implantation

KW - Plasma applications

KW - Plasma sheath

UR - http://www.scopus.com/inward/record.url?scp=0032046865&partnerID=8YFLogxK

U2 - 10.1109/27.669623

DO - 10.1109/27.669623

M3 - Article

SN - 0093-3813

VL - 26

SP - 175

EP - 180

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 2

ER -

Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

Abstract

Access to Document

Other files and links

Fingerprint

Cite this