Plasma synthesis of catalytic thin films

A. L. Thomann; J. P. Rozenbaum; P. Brault; C. Andreazza; P. Andreazza; B. Rousseau; H. Estrade-Szwarckopf; A. Berthet; J. C. Bertolin; F. J. Cadete; Santos Aires; F. Monnet; C. Mirodatos; C. Charles; R. Boswel

doi:10.1351/pac200274030471

Plasma synthesis of catalytic thin films

A. L. Thomann^*, J. P. Rozenbaum, P. Brault, C. Andreazza, P. Andreazza, B. Rousseau, H. Estrade-Szwarckopf, A. Berthet, J. C. Bertolin, F. J. Cadete, Santos Aires, F. Monnet, C. Mirodatos, C. Charles, R. Boswel

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

Original language	English
Pages (from-to)	471-474
Number of pages	4
Journal	Pure and Applied Chemistry
Volume	74
Issue number	3
DOIs	https://doi.org/10.1351/pac200274030471
Publication status	Published - 2002
Externally published	Yes

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@article{6cc27e61ad4b46bc816e31d11c316c4f,

title = "Plasma synthesis of catalytic thin films",

abstract = "Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.",

author = "Thomann, \{A. L.\} and Rozenbaum, \{J. P.\} and P. Brault and C. Andreazza and P. Andreazza and B. Rousseau and H. Estrade-Szwarckopf and A. Berthet and Bertolin, \{J. C.\} and Cadete, \{F. J.\} and Santos Aires and F. Monnet and C. Mirodatos and C. Charles and R. Boswel",

year = "2002",

doi = "10.1351/pac200274030471",

language = "English",

volume = "74",

pages = "471--474",

journal = "Pure and Applied Chemistry",

issn = "0033-4545",

publisher = "Walter de Gruyter GmbH",

number = "3",

}

TY - JOUR

T1 - Plasma synthesis of catalytic thin films

AU - Thomann, A. L.

AU - Rozenbaum, J. P.

AU - Brault, P.

AU - Andreazza, C.

AU - Andreazza, P.

AU - Rousseau, B.

AU - Estrade-Szwarckopf, H.

AU - Berthet, A.

AU - Bertolin, J. C.

AU - Cadete, F. J.

AU - Aires, Santos

AU - Monnet, F.

AU - Mirodatos, C.

AU - Charles, C.

AU - Boswel, R.

PY - 2002

Y1 - 2002

N2 - Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

AB - Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

UR - https://www.scopus.com/pages/publications/0036296008

U2 - 10.1351/pac200274030471

DO - 10.1351/pac200274030471

M3 - Article

SN - 0033-4545

VL - 74

SP - 471

EP - 474

JO - Pure and Applied Chemistry

JF - Pure and Applied Chemistry

IS - 3

ER -

Plasma synthesis of catalytic thin films

Abstract

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