Point defect engineered Si sub-bandgap light-emitting diodes

Jiming Bao*, Supakit Charnvanichborikarn, Yu Yang, Malek Tabbal, Byungha Shin, Jennifer Wong-Leung, James S. Williams, Michael J. Aziz, Federico Capasso

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    2 Citations (Scopus)

    Abstract

    We present a novel approach to enhance light emission in Si and demonstrate sub-bandgap light-emitting diodes (LED) based on the introduction of point defects. Ion implantation, pulsed laser melting and rapid thermal annealing were used to create LEDs containing self-interstitial-rich optically active regions. Procedures to fabricate LEDs on a bulk silicon substrate and on a silicon-on-insulator (SOI) wafer will be presented, and methods to improve device performances will be discussed. The control and utilization of point defects represents a new approach toward creating Si in a stable, optically active form for Si-based optoelectronics.

    Original languageEnglish
    Title of host publicationDevice and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV
    DOIs
    Publication statusPublished - 2008
    EventDevice and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV - Canberra, Australia
    Duration: 5 Dec 20077 Dec 2007

    Publication series

    NameProceedings of SPIE - The International Society for Optical Engineering
    Volume6800
    ISSN (Print)0277-786X

    Conference

    ConferenceDevice and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV
    Country/TerritoryAustralia
    CityCanberra
    Period5/12/077/12/07

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