Original language | English |
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Pages (from-to) | 2pp |
Journal | Journal of Applied Physics |
Volume | 121 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2017 |
Porosity as a function of stoichiometry and implantation temperature in Ge/Si1-xGex alloys (vol 119, 094303, 2016)
Huda Alkhaldi, Felipe Kremer, Thomas Bierschenk, J L Hansen, A Nylandsted-Larsen, Jim Williams, Mark C Ridgway
Research output: Contribution to journal › Literature review