Porosity as a function of stoichiometry and implantation temperature in Ge/Si1-xGex alloys (vol 119, 094303, 2016)

Huda Alkhaldi; Felipe Kremer; Thomas Bierschenk; J L Hansen; A Nylandsted-Larsen; Jim Williams; Mark C Ridgway

doi:10.1063/1.4975029

Porosity as a function of stoichiometry and implantation temperature in Ge/Si1-xGex alloys (vol 119, 094303, 2016)

Huda Alkhaldi
, Felipe Kremer
, Thomas Bierschenk
, J L Hansen
, A Nylandsted-Larsen
, Jim Williams
, Mark C Ridgway

Research output: Contribution to journal › Literature review

Original language	English
Pages (from-to)	2pp
Journal	Journal of Applied Physics
Volume	121
Issue number	4
DOIs	https://doi.org/10.1063/1.4975029
Publication status	Published - 2017

Access to Document

10.1063/1.4975029

Cite this

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title = "Porosity as a function of stoichiometry and implantation temperature in Ge/Si1-xGex alloys (vol 119, 094303, 2016)",

author = "Huda Alkhaldi and Felipe Kremer and Thomas Bierschenk and Hansen, \{J L\} and A Nylandsted-Larsen and Jim Williams and Ridgway, \{Mark C\}",

year = "2017",

doi = "10.1063/1.4975029",

language = "English",

volume = "121",

pages = "2pp",

journal = "Journal of Applied Physics",

publisher = "American Institute of Physics (AIP)",

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T1 - Porosity as a function of stoichiometry and implantation temperature in Ge/Si1-xGex alloys (vol 119, 094303, 2016)

AU - Alkhaldi, Huda

AU - Kremer, Felipe

AU - Bierschenk, Thomas

AU - Hansen, J L

AU - Nylandsted-Larsen, A

AU - Williams, Jim

AU - Ridgway, Mark C

PY - 2017

Y1 - 2017

U2 - 10.1063/1.4975029

DO - 10.1063/1.4975029

M3 - Literature review

VL - 121

SP - 2pp

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 4

ER -