TY - JOUR
T1 - Radial Growth Evolution of InGaAs/InP Multi- Quantum-Well Nanowires Grown by Selective- Area Metal Organic Vapor-Phase Epitaxy
AU - Yang, Inseok
AU - Zhang, Xu
AU - Zheng, Changlin
AU - Gao, Qian
AU - Li, Ziyuan
AU - Li, Li
AU - Lockrey, Mark N.
AU - Nguyen, Hieu
AU - Caroff, Philippe
AU - Etheridge, Joanne
AU - Tan, Hark Hoe
AU - Jagadish, Chennupati
AU - Wong-Leung, Jennifer
AU - Fu, Lan
N1 - Publisher Copyright:
© 2018 American Chemical Society. All rights reserved.
PY - 2018
Y1 - 2018
N2 - III-V semiconductor multi-quantum-well nanowires (MQW NWs) via selective-area epitaxy (SAE) is of great importance for the development of nanoscale light-emitting devices for applications such as optical communication, silicon photonics, and quantum computing. To achieve highly efficient light-emitting devices, not only the high-quality materials but also a deep understanding of their growth mechanisms and material properties (structural, optical, and electrical) are extremely critical. In particular, the three-dimensional growth mechanism of MQWs embedded in a NW structure by SAE is expected to be different from that of those grown in a planar structure or with a catalyst and has not yet been thoroughly investigated. In this work, we reveal a distinctive radial growth evolution of InGaAs/InP MQW NWs grown by the SAE metal organic vapor-phase epitaxy (MOVPE) technique. We observe the formation of zinc blende (ZB) QW discs induced by the axial InGaAs QW growth on the wurtzite (WZ) base-InP NW and propose it as the key factor driving the overall structure of radial growth. The role of the ZB-to-WZ change in the driving of the overall growth evolution is supported by a growth formalism, taking into account the formation-energy difference between different facets. Despite a polytypic crystal structure with mixed ZB and WZ phases across the MQW region, the NWs exhibit high uniformity and desirable QW spatial layout with bright room-temperature photoluminescence at an optical communication wavelength of ∼1.3 μm, which is promising for the future development of high-efficiency light-emitting devices.
AB - III-V semiconductor multi-quantum-well nanowires (MQW NWs) via selective-area epitaxy (SAE) is of great importance for the development of nanoscale light-emitting devices for applications such as optical communication, silicon photonics, and quantum computing. To achieve highly efficient light-emitting devices, not only the high-quality materials but also a deep understanding of their growth mechanisms and material properties (structural, optical, and electrical) are extremely critical. In particular, the three-dimensional growth mechanism of MQWs embedded in a NW structure by SAE is expected to be different from that of those grown in a planar structure or with a catalyst and has not yet been thoroughly investigated. In this work, we reveal a distinctive radial growth evolution of InGaAs/InP MQW NWs grown by the SAE metal organic vapor-phase epitaxy (MOVPE) technique. We observe the formation of zinc blende (ZB) QW discs induced by the axial InGaAs QW growth on the wurtzite (WZ) base-InP NW and propose it as the key factor driving the overall structure of radial growth. The role of the ZB-to-WZ change in the driving of the overall growth evolution is supported by a growth formalism, taking into account the formation-energy difference between different facets. Despite a polytypic crystal structure with mixed ZB and WZ phases across the MQW region, the NWs exhibit high uniformity and desirable QW spatial layout with bright room-temperature photoluminescence at an optical communication wavelength of ∼1.3 μm, which is promising for the future development of high-efficiency light-emitting devices.
KW - III-V compound semiconductors
KW - InGaAs/InP quantum wells
KW - MOVPE
KW - growth mechanism
KW - nanowires
KW - selective-area epitaxy
UR - http://www.scopus.com/inward/record.url?scp=85054659854&partnerID=8YFLogxK
U2 - 10.1021/acsnano.8b05771
DO - 10.1021/acsnano.8b05771
M3 - Article
SN - 1936-0851
VL - 12
SP - 10374
EP - 10382
JO - ACS Nano
JF - ACS Nano
IS - 10
ER -