TY - JOUR
T1 - Recent Advances in Materials Design Using Atomic Layer Deposition for Energy Applications
AU - Gupta, Bikesh
AU - Hossain, Md Anower
AU - Riaz, Asim
AU - Sharma, Astha
AU - Zhang, Doudou
AU - Tan, Hark Hoe
AU - Jagadish, Chennupati
AU - Catchpole, Kylie
AU - Hoex, Bram
AU - Karuturi, Siva
N1 - Publisher Copyright:
© 2021 Wiley-VCH GmbH.
PY - 2022/1/14
Y1 - 2022/1/14
N2 - The design and development of materials at the nanoscale has enabled efficient, cutting-edge renewable energy storage, and conversion devices such as solar cells, water splitting, fuel cells, batteries, and supercapacitors. In addition to creating new materials, the ability to refine the structure and interface properties holds the key to achieving superior performance and durability of these devices. Atomic layer deposition (ALD) has become an important tool for nanofabrication as it allows the deposition of pin-hole-free films with atomic-level thickness and composition control over high aspect ratio surfaces. ALD is successfully used to fabricate devices for renewable energy storage and conversion, for example, to deposit absorber materials, passivation layers, selective contacts, catalyst films, protection barriers, etc. In this review article, recent advances enabled by ALD in designing materials for high-performance solar cells, catalytic energy conversion systems, batteries, and fuel cells, are summarized. The critical issues impeding the performance and durability of these devices are introduced and then the role of ALD in addressing them is discussed. Finally, the challenges in the implementation of ALD technique for nanofabrication on industrial scale are highlighted and a perspective on potential solutions is provided.
AB - The design and development of materials at the nanoscale has enabled efficient, cutting-edge renewable energy storage, and conversion devices such as solar cells, water splitting, fuel cells, batteries, and supercapacitors. In addition to creating new materials, the ability to refine the structure and interface properties holds the key to achieving superior performance and durability of these devices. Atomic layer deposition (ALD) has become an important tool for nanofabrication as it allows the deposition of pin-hole-free films with atomic-level thickness and composition control over high aspect ratio surfaces. ALD is successfully used to fabricate devices for renewable energy storage and conversion, for example, to deposit absorber materials, passivation layers, selective contacts, catalyst films, protection barriers, etc. In this review article, recent advances enabled by ALD in designing materials for high-performance solar cells, catalytic energy conversion systems, batteries, and fuel cells, are summarized. The critical issues impeding the performance and durability of these devices are introduced and then the role of ALD in addressing them is discussed. Finally, the challenges in the implementation of ALD technique for nanofabrication on industrial scale are highlighted and a perspective on potential solutions is provided.
UR - http://www.scopus.com/inward/record.url?scp=85120500700&partnerID=8YFLogxK
U2 - 10.1002/adfm.202109105
DO - 10.1002/adfm.202109105
M3 - Review article
SN - 1616-301X
VL - 32
JO - Advanced Functional Materials
JF - Advanced Functional Materials
IS - 3
M1 - 2109105
ER -