Recombination in n- and p-type silicon emitters contaminated with iron

Daniel Macdonald*, Helmut Mäckel, Andrés Cuevas

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    7 Citations (Scopus)

    Abstract

    Crystalline silicon wafers containing deliberately introduced Fe were subject to phosphorus and boron diffusions, in order to examine the effect of gettered Fe on the recombination properties of the diffused emitter regions. For the case of boron diffusions, the presence of gettered Fe caused increased recombination in the emitter region, while for phosphorus diffusions there was no noticeable effect. This occurred despite the fact that the boron diffusions were much less effective at gettering Fe from the wafer. The results can apparently be explained by the reduced recombination activity of the Fe-related centres in n-type silicon compared to p-type.

    Original languageEnglish
    Title of host publicationConference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
    PublisherIEEE Computer Society
    Pages952-955
    Number of pages4
    ISBN (Print)1424400163, 9781424400164
    DOIs
    Publication statusPublished - 2006
    Event2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 - Waikoloa, HI, United States
    Duration: 7 May 200612 May 2006

    Publication series

    NameConference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
    Volume1

    Conference

    Conference2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
    Country/TerritoryUnited States
    CityWaikoloa, HI
    Period7/05/0612/05/06

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