Refractive indices and thicknesses of optical waveguides fabricated by silicon ion implantation into silica glass

J. Gazecki*, J. M. Kubica, M. Zamora, G. K. Reeves, C. M. Johnson, M. C. Ridgway

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    13 Citations (Scopus)

    Abstract

    Planar optical waveguides formed by Si ion implantation into PECVD SiO2 have been characterized by the dark mode spectroscopy method at a wavelength of 0.6328 μm. The measured effective index values of the guided modes have been used to investigate the optical properties of the core layers of the waveguides after different pre-implantation treatments. It was found that annealing the specimens before implantation, affected both the refractive index and thickness of the core layers. In the annealed specimens a thicker core layer and a larger relative refractive index difference between the core and the buffer layer resulted.

    Original languageEnglish
    Pages (from-to)233-236
    Number of pages4
    JournalThin Solid Films
    Volume340
    Issue number1
    DOIs
    Publication statusPublished - 26 Feb 1999

    Fingerprint

    Dive into the research topics of 'Refractive indices and thicknesses of optical waveguides fabricated by silicon ion implantation into silica glass'. Together they form a unique fingerprint.

    Cite this