Abstract
A resistive switching memory device consisting of reduced graphene oxide and indium tin oxide as top/bottom two electrodes, separated by dielectric MoS2 nanosphere assemblies as the active interlayer, was fabricated. This device exhibits the rewritable nonvolatile resistive switching with low SET/RESET voltage (∼2 V), high ON/OFF resistance ratio (∼10 4), and superior electrical bistability, introducing a potential application in data storage field. The resistance switching mechanism was analyzed in the assumptive model of the electron tunneling across the polarized potential barriers.
Original language | English |
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Article number | 033504 |
Journal | Applied Physics Letters |
Volume | 104 |
Issue number | 3 |
DOIs | |
Publication status | Published - 20 Jan 2014 |
Externally published | Yes |