Scanning ion deep level transient spectroscopy

J. S. Laird*, R. A. Bardos, C. Jagadish, D. N. Jamieson, G. J.F. Legge

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    18 Citations (Scopus)

    Abstract

    We describe a new spectroscopic technique on the MeV ion microprobe, which allows the mapping of electrically active defects within a semiconductor. The technique known here as Scanning Ion Deep Level Transient Spectroscopy (SIDLTS) is analogous to the bulk technique Deep Level Transient Spectroscopy (DLTS). In SIDLTS, the electron-hole (e-h) plasma induced by the MeV ion provides the trap-filling pulse. A simple theoretical framework for sensitivity is discussed as is the system developed to achieve it. A comparison of DLTS and SIDLTS on an implanted Au-Si Schottky barrier is made, including quantitative estimations of the trap activation energies and sensitivity.

    Original languageEnglish
    Pages (from-to)464-469
    Number of pages6
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume158
    Issue number1
    DOIs
    Publication statusPublished - 2 Sept 1999
    EventProceedings of the 1998 6th International Conference on Nuclear Microprobe Technology and Applications (ICNMTA) - Cape Town, S Afr
    Duration: 11 Oct 199816 Oct 1998

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