Abstract
We describe a new spectroscopic technique on the MeV ion microprobe, which allows the mapping of electrically active defects within a semiconductor. The technique known here as Scanning Ion Deep Level Transient Spectroscopy (SIDLTS) is analogous to the bulk technique Deep Level Transient Spectroscopy (DLTS). In SIDLTS, the electron-hole (e-h) plasma induced by the MeV ion provides the trap-filling pulse. A simple theoretical framework for sensitivity is discussed as is the system developed to achieve it. A comparison of DLTS and SIDLTS on an implanted Au-Si Schottky barrier is made, including quantitative estimations of the trap activation energies and sensitivity.
| Original language | English |
|---|---|
| Pages (from-to) | 464-469 |
| Number of pages | 6 |
| Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
| Volume | 158 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2 Sept 1999 |
| Event | Proceedings of the 1998 6th International Conference on Nuclear Microprobe Technology and Applications (ICNMTA) - Cape Town, S Afr Duration: 11 Oct 1998 → 16 Oct 1998 |
Fingerprint
Dive into the research topics of 'Scanning ion deep level transient spectroscopy'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver