Abstract
Photon-stimulated desorption of H+ from hydrogenated GaAs (110) and (100) surfaces was studied as a function of photon energy. Distinct peaks, observed around As 3d core-level binding energy for desorption from the GaAs (100) surface and in the As 3d and Ga 3p region for desorption from the GaAs (110) surface, show a striking similarity with the fine structure (spin-orbit splitting) measured in the photoemission from As 3d and Ga 3p levels. These results provide clear evidence for direct desorption processes and represent a basis for selective modification of hydrogenated GaAs surfaces.
| Original language | English |
|---|---|
| Pages (from-to) | 2255-2258 |
| Number of pages | 4 |
| Journal | Physical Review Letters |
| Volume | 84 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 2000 |