Abstract
We demonstrate a novel approach for selectively immobiliz-ing semiconductor core-shell quantum dots directly on metal-free substrates with nanoscale resolution. This is accomplished by defining a mask via electron-beam lithography (EBL) followed by the functionalization of only the exposed areas of the substrate with quantum dots using a heterobi-functional linker. Non-specific binding is suppressed by a binding inhibitor. (
| Original language | English |
|---|---|
| Pages (from-to) | 710-713 |
| Number of pages | 4 |
| Journal | Physica Status Solidi - Rapid Research Letters |
| Volume | 8 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - Aug 2014 |
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