Sidewall slopes of SU-8 HARMST using deep x-ray lithography

K. D. Vora, B. Y. Shew, E. C. Harvey, J. P. Hayes, A. G. Peele

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

We describe a model that predicts sidewall slope in SU-8 high aspect ratio microstructures made using x-ray lithography. Our experimental results are in accordance with our model and we demonstrate that essentially zero sidewall taper can be obtained under certain conditions. We use our results to explore the feasibility of optimizing a structure simultaneously for slope and surface roughness.

Original languageEnglish
Article number035037
JournalJournal of Micromechanics and Microengineering
Volume18
Issue number3
DOIs
Publication statusPublished - 1 Mar 2008
Externally publishedYes

Fingerprint

Dive into the research topics of 'Sidewall slopes of SU-8 HARMST using deep x-ray lithography'. Together they form a unique fingerprint.

Cite this