Single-shot ultrafast laser processing of high-aspect-ratio nanochannels using elliptical Bessel beams

Ultrafast lasers have revolutionized material processing, opening a wealth of new applications in many areas of science. A recent technology that allows the cleaving of transparent materials via non-ablative processes is based on focusing and translating a high-intensity laser beam within a material to induce a well-defined internal stress plane. This then enables material separation without debris generation. Here, we use a non-diffracting beam engineered to have a transverse elliptical spatial profile to generate high-aspect-ratio elliptical channels in glass of a dimension 350 nm × 710 nm and subsequent cleaved surface uniformity at the sub-micron level.