Solution-Based Photo-Patterned Gold Film Formation on Silicon Nitride

Y. M. Nuwan, D. Y. Bandara, Buddini Iroshika Karawdeniya, Julie C. Whelan, Lucas D.S. Ginsberg, Jason R. Dwyer*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Silicon nitride fabricated by low-pressure chemical vapor deposition (LPCVD) to be silicon-rich (SiNx), is a ubiquitous insulating thin film in the microelectronics industry, and an exceptional structural material for nanofabrication. Free-standing <100 nm thick SiNx membranes are especially compelling, particularly when used to deliver forefront molecular sensing capabilities in nanofluidic devices. We developed an accessible, gentle, and solution-based photodirected surface metallization approach well-suited to forming patterned metal films as integral structural and functional features in thin-membrane-based SiNx devices-for use as electrodes or surface chemical functionalization platforms, for example-augmenting existing device capabilities and properties for a wide range of applications.

Original languageEnglish
Pages (from-to)34964-34969
Number of pages6
JournalACS applied materials & interfaces
Volume8
Issue number51
DOIs
Publication statusPublished - 28 Dec 2016
Externally publishedYes

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