Spatially resolved characterization of InGaAs/GaAs quantum dot structures by scanning spreading resistance microscopy

T. Hakkarainen*, O. Douhéret, S. Anand, L. Fu, H. H. Tan, C. Jagadish

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    6 Citations (Scopus)

    Abstract

    Cross-sectional scanning spreading resistance microscopy (SSRM) is used to investigate stacked InGaAs/GaAs quantum dot (QD) structures with different doping schemes. Spatially resolved imaging of the QDs by SSRM is demonstrated. The SSRM contrast obtained for the QD layers is found to depend on doping in the structure. In the undoped structures both QD-layers and QDs within the layers could be resolved, while in the doped structures the QD layers appear more or less uniformly broadened. The origin of the SSRM contrast in the QD layer in the different samples is discussed and correlated with doping schemes.

    Original languageEnglish
    Article number041106
    JournalApplied Physics Letters
    Volume97
    Issue number4
    DOIs
    Publication statusPublished - 26 Jul 2010

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