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Specific Ion Effects at the Vapor-Formamide Interface: A Reverse Hofmeister Series in Ion Concentration Depth Profiles

  • Anand Kumar
  • , Vincent S.J. Craig
  • , Hayden Robertson
  • , Alister J. Page
  • , Grant B. Webber
  • , Erica J. Wanless
  • , Valerie D. Mitchell
  • , Gunther G. Andersson*
  • *Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    6 Citations (Scopus)

    Abstract

    Employing neutral impact collision ion scattering spectroscopy (NICISS), we have directly measured the concentration depth profiles (CDPs) of various monovalent ions at the vapor-formamide interface. NICISS provides CDPs of individual ions by measuring the energy loss of neutral helium atoms backscattered from the solution interface. CDPs at the vapor-formamide interface of Cl-, Br-, I-, Na+, K+, and Cs+ are measured and compared to elucidate the interfacial specific ion trends. We report a reverse Hofmeister series in the presence of inorganic ions (anion and cation) at the vapor-formamide interface relative to the water-vapor interface, and the CDPs are found to be independent of the counterion for most ions studied. Thus, ions at the surface of formamide follow a “Hofmeister paradigm” where the counterion does not impact the ion series. These specific ion trends are complemented with surface tension and X-ray absorption near-edge structure (XANES) measurements on formamide electrolyte solutions.

    Original languageEnglish
    Pages (from-to)12618-12626
    Number of pages9
    JournalLangmuir
    Volume39
    Issue number36
    DOIs
    Publication statusPublished - 12 Sept 2023

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