TY - JOUR
T1 - Spectral measurements of inductively coupled and m = +1, - 1 helicon discharge modes of the constructed plasma source
AU - Khoshhal, Mohammadreza
AU - Habibi, Morteza
AU - Boswell, Rod
N1 - Publisher Copyright:
© 2020 Author(s).
PY - 2020/6/1
Y1 - 2020/6/1
N2 - In the present context, the industrial type of Amirkabir helicon plasma source has been introduced that was designed and constructed at the Helicon Plasma Laboratory of Amirkabir University of Technology with the aim of using it in material processing applications. Helicon plasma in two m = +1 and m = -1 modes of operation was studied, and also its application was compared with the inductively coupled plasma (ICP) mode in this experimental work. This study was performed by employing two techniques including optical emission spectroscopy and imaging using a camera with polarizing filters, in which the images and spectra of ICP and m = +1, -1 helicon plasma modes were recorded under the experimental conditions. The effects of the device operational parameters on the argon plasma emission spectra were investigated in the wavelength range of 350-950 nm. It was observed from the comparison of the plasma spectra that the ionization rate increases significantly for the plasma helicon mode than ICP and also for m = +1 helicon mode of operation than m = -1. In this work, the values of device operational parameters such as the RF power delivered to the half-helix antenna, external magnetic field intensity, and the injected gas flow rate were varied in the range of 400-900 W, 100-300 mT, and 1-10 SCCM in the experiment, respectively. In addition, the optimum values of RF power, magnetic field intensity, and the injected gas flow rate for achieving the maximum ionization rate were, respectively, obtained as 900 W, 300 mT, and 3 SCCM.
AB - In the present context, the industrial type of Amirkabir helicon plasma source has been introduced that was designed and constructed at the Helicon Plasma Laboratory of Amirkabir University of Technology with the aim of using it in material processing applications. Helicon plasma in two m = +1 and m = -1 modes of operation was studied, and also its application was compared with the inductively coupled plasma (ICP) mode in this experimental work. This study was performed by employing two techniques including optical emission spectroscopy and imaging using a camera with polarizing filters, in which the images and spectra of ICP and m = +1, -1 helicon plasma modes were recorded under the experimental conditions. The effects of the device operational parameters on the argon plasma emission spectra were investigated in the wavelength range of 350-950 nm. It was observed from the comparison of the plasma spectra that the ionization rate increases significantly for the plasma helicon mode than ICP and also for m = +1 helicon mode of operation than m = -1. In this work, the values of device operational parameters such as the RF power delivered to the half-helix antenna, external magnetic field intensity, and the injected gas flow rate were varied in the range of 400-900 W, 100-300 mT, and 1-10 SCCM in the experiment, respectively. In addition, the optimum values of RF power, magnetic field intensity, and the injected gas flow rate for achieving the maximum ionization rate were, respectively, obtained as 900 W, 300 mT, and 3 SCCM.
UR - http://www.scopus.com/inward/record.url?scp=85088528781&partnerID=8YFLogxK
U2 - 10.1063/1.5140346
DO - 10.1063/1.5140346
M3 - Article
SN - 2158-3226
VL - 10
JO - AIP Advances
JF - AIP Advances
IS - 6
M1 - 065312
ER -