Stoichiometric low loss tellurium oxide thin films for photonic applications

Khu T. Vu; Steve J. Madden; Barry Luther-Davies; Douglas Bulla

doi:10.1109/OECCACOFT.2008.4610455

Stoichiometric low loss tellurium oxide thin films for photonic applications

Khu T. Vu, Steve J. Madden, Barry Luther-Davies, Douglas Bulla

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Citations (Scopus)

Abstract

Stoichiometric low loss Tellurium Oxide, TeO₂, films have been produced by reactive RF sputtering. TeO₂ films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.

Original language	English
Title of host publication	2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008
DOIs	https://doi.org/10.1109/OECCACOFT.2008.4610455
Publication status	Published - 2008
Event	2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008 - Sydney, NSW, Australia Duration: 7 Jul 2008 → 10 Jul 2008

Publication series

Name	2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008

Conference

Conference	2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008
Country/Territory	Australia
City	Sydney, NSW
Period	7/07/08 → 10/07/08

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10.1109/OECCACOFT.2008.4610455

Cite this

Vu, K. T., Madden, S. J., Luther-Davies, B., & Bulla, D. (2008). Stoichiometric low loss tellurium oxide thin films for photonic applications. In 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008 Article 4610455 (2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008). https://doi.org/10.1109/OECCACOFT.2008.4610455

Vu, Khu T. ; Madden, Steve J. ; Luther-Davies, Barry et al. / Stoichiometric low loss tellurium oxide thin films for photonic applications. 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008. 2008. (2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008).

@inproceedings{a40674d8e5d34e4aa6a94b6918da625f,

title = "Stoichiometric low loss tellurium oxide thin films for photonic applications",

abstract = "Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.",

author = "Vu, {Khu T.} and Madden, {Steve J.} and Barry Luther-Davies and Douglas Bulla",

year = "2008",

doi = "10.1109/OECCACOFT.2008.4610455",

language = "English",

isbn = "0858258072",

series = "2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008",

booktitle = "2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008",

note = "2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008 ; Conference date: 07-07-2008 Through 10-07-2008",

}

Vu, KT, Madden, SJ, Luther-Davies, B & Bulla, D 2008, Stoichiometric low loss tellurium oxide thin films for photonic applications. in 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008., 4610455, 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008, 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008, Sydney, NSW, Australia, 7/07/08. https://doi.org/10.1109/OECCACOFT.2008.4610455

Stoichiometric low loss tellurium oxide thin films for photonic applications. / Vu, Khu T.; Madden, Steve J.; Luther-Davies, Barry et al.
2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008. 2008. 4610455 (2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Stoichiometric low loss tellurium oxide thin films for photonic applications

AU - Vu, Khu T.

AU - Madden, Steve J.

AU - Luther-Davies, Barry

AU - Bulla, Douglas

PY - 2008

Y1 - 2008

N2 - Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.

AB - Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.

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U2 - 10.1109/OECCACOFT.2008.4610455

DO - 10.1109/OECCACOFT.2008.4610455

M3 - Conference contribution

SN - 0858258072

SN - 9780858258075

T3 - 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008

BT - 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008

T2 - 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008

Y2 - 7 July 2008 through 10 July 2008

ER -

Vu KT, Madden SJ, Luther-Davies B, Bulla D. Stoichiometric low loss tellurium oxide thin films for photonic applications. In 2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008. 2008. 4610455. (2008 Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference On Optical Fibre Technology, OECC/ACOFT 2008). doi: 10.1109/OECCACOFT.2008.4610455

Stoichiometric low loss tellurium oxide thin films for photonic applications

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