Abstract
GaAs nanowires were grown on Si (111) substrates. By coating a thin GaAs buffer layer on Si surface and using a two-temperature growth, the morphology and crystal structure of GaAs nanowires were dramatically improved. The strained GaAs/GaP core-shell nanowires, based on the improved GaAs nanowires with a shell thickness of 25 nm, showed a significant shift in emission energy of 260 meV from the unstrained GaAs nanowires.
| Original language | English |
|---|---|
| Title of host publication | 2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings |
| Publisher | IEEE |
| Pages | 57-58 |
| Number of pages | 2 |
| ISBN (Print) | 9781424473328 |
| DOIs | |
| Publication status | Published - 2010 |
| Event | 2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 - Canberra, ACT, Australia Duration: 12 Dec 2010 → 15 Dec 2010 |
Conference
| Conference | 2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 |
|---|---|
| Country/Territory | Australia |
| City | Canberra, ACT |
| Period | 12/12/10 → 15/12/10 |
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