Structural and optical properties of H implanted ZnO

K. S. Chan*, J. D. Ye, P. Parkinson, E. Monakhov, K. M. Johansen, L. Vines, B. G. Svensson, C. Jagadish, J. Wong-Leung

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    ZnO is a wide bandgap semiconductor with huge potential to fabricate optoelectronic devices operating in the UV region. However, it is still not possible to achieve p-type ZnO, with hydrogen suggested to be a shallow donor that contributes significantly to the n-type conductivity in as grown ZnO. A better understanding on the role of H in ZnO is needed to realise p-type doping in ZnO. In this research, we utilised multiple structural and optical techniques to study the effects caused by H implantation in ZnO. The H implanted region in single crystal ZnO substrate was characterised by X-Ray diffraction, photoluminescence spectroscopy, secondary ion mass spectroscopy and transmission electron microscopy. XRD results show that H implantation created deformed layers with strain increasing linearly with implantation dose. A blue shift is also observed from the UV photoluminescence emission of the H implanted ZnO.

    Original languageEnglish
    Title of host publication2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012 - Proceedings
    Pages219-220
    Number of pages2
    DOIs
    Publication statusPublished - 2012
    Event2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012 - Melbourne, VIC, Australia
    Duration: 12 Dec 201214 Dec 2012

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

    Conference

    Conference2012 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2012
    Country/TerritoryAustralia
    CityMelbourne, VIC
    Period12/12/1214/12/12

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