Structural characterization of amorphised InAs with synchrotron radiation

G. de M. Azevedo, M. C. Ridgway, K. M. Yu, C. J. Glover, G. J. Foran

    Research output: Contribution to journalArticlepeer-review

    13 Citations (Scopus)

    Abstract

    Extended X-ray absorption fine structure measurements have been utilized to determine the structural parameters of InAs amorphised by ion implantation. Relative to crystalline standards, increases in bond length and Debye-Waller factor were apparent. Our results indicate that a total coordination number of four atoms, as observed in the crystalline phase, is retained in the amorphous material. Furthermore, homopolar bonding, forbidden in the crystalline phase, is present in the amorphous material and, apparently, in amorphous III-V semiconductors in general.

    Original languageEnglish
    Pages (from-to)851-855
    Number of pages5
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume190
    Issue number1-4
    DOIs
    Publication statusPublished - May 2002

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