Suppression of interdiffusion in GaAs/AlGaAs quantum-well structure capped with dielectric films by deposition of gallium oxide

L. Fu^*, J. Wong-Leung, P. N.K. Deenapanray, H. H. Tan, C. Jagadish, Bin Gong, R. N. Lamb, R. M. Cohen, W. Reichert, L. V. Dao, M. Gal

^*Corresponding author for this work

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