TY - JOUR
T1 - Surface Fluorination of ALD TiO2 Electron Transport Layer for Efficient Planar Perovskite Solar Cells
AU - Zardetto, Valerio
AU - di Giacomo, Francesco
AU - Lifka, Herbert
AU - Verheijen, Marcel A.
AU - Weijtens, Christ H.L.
AU - Black, Lachlan E.
AU - Veenstra, Sjoerd
AU - Kessels, Wilhelmus M.M.
AU - Andriessen, Ronn
AU - Creatore, Mariadriana
N1 - Publisher Copyright:
© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2018/5/9
Y1 - 2018/5/9
N2 - Perovskite solar cells (PSCs) are emerging among the photovoltaic (PV) technologies due to their high power conversion efficiency (PCE) in combination with potentially low cost manufacturing processing. In this contribution, the fabrication of efficient planar n-i-p PSCs by the modification of the electron transport layer (ETL) adopted as n-type contact is demonstrated. Specifically, a fluorine-based plasma treatment prior to perovskite deposition leads to surface fluorination of the TiO2 ETL. The presence of fluorine on the TiO2 surface drastically improves the adhesion between the ALD layer and the methylammonium lead iodide perovskite film, and leads to a more favourable energy band alignment, accompanied by a faster electron carrier extraction at the interface. As consequence of surface fluorination, we observe a significant reduction in the current density-voltage curve hysteresis with respect to the ALD based reference sample, as well as a remarkable improvement in power conversion efficiency from 4% up to a stable 14.8%.
AB - Perovskite solar cells (PSCs) are emerging among the photovoltaic (PV) technologies due to their high power conversion efficiency (PCE) in combination with potentially low cost manufacturing processing. In this contribution, the fabrication of efficient planar n-i-p PSCs by the modification of the electron transport layer (ETL) adopted as n-type contact is demonstrated. Specifically, a fluorine-based plasma treatment prior to perovskite deposition leads to surface fluorination of the TiO2 ETL. The presence of fluorine on the TiO2 surface drastically improves the adhesion between the ALD layer and the methylammonium lead iodide perovskite film, and leads to a more favourable energy band alignment, accompanied by a faster electron carrier extraction at the interface. As consequence of surface fluorination, we observe a significant reduction in the current density-voltage curve hysteresis with respect to the ALD based reference sample, as well as a remarkable improvement in power conversion efficiency from 4% up to a stable 14.8%.
KW - CF plasma
KW - TiO
KW - low-temperature atomic layer deposition
KW - perovskite
KW - surface treatment
UR - http://www.scopus.com/inward/record.url?scp=85043592309&partnerID=8YFLogxK
U2 - 10.1002/admi.201701456
DO - 10.1002/admi.201701456
M3 - Article
SN - 2196-7350
VL - 5
JO - Advanced Materials Interfaces
JF - Advanced Materials Interfaces
IS - 9
M1 - 1701456
ER -