Skip to main navigation Skip to search Skip to main content

Surface passivation of black silicon by thermal ALD deposited aluminum oxide

  • M. Otto
  • , M. Kroll
  • , T. Käsebier
  • , M. Ernst
  • , R. Salzer
  • , R. B. Wehrspohn

    Research output: Chapter in Book/Report/Conference proceeding › Conference Paper › peer-review

    Abstract

    Black silicon (bSi) surfaces can be effectivly passivated by thermal ALD. The nanosturcures with aspect ratios up to 10 show excellent anti-reflection and light-trapping properties with absorption in the visible spectrum of over 97%.

    Original languageEnglish
    Title of host publicationOptical Instrumentation for Energy and Environmental Applications 2011
    Subtitle of host publicationRenewable Energy and the Environment
    PublisherOptica Publishing Group
    ISBN (Print)9781557529206
    DOIs
    Publication statusPublished - 2011
    EventSolid-State and Organic Lighting, SOLED 2011 - Austin, TX, United States
    Duration: 2 Nov 2011 → 3 Nov 2011

    Publication series

    NameOptics InfoBase Conference Papers
    ISSN (Electronic)2162-2701

    Conference

    ConferenceSolid-State and Organic Lighting, SOLED 2011
    Country/TerritoryUnited States
    CityAustin, TX
    Period2/11/11 → 3/11/11

    Fingerprint

    Dive into the research topics of 'Surface passivation of black silicon by thermal ALD deposited aluminum oxide'. Together they form a unique fingerprint.

    Cite this