Tellurium oxide thin film waveguides for integrated photonics

Khu T. Vu*, Steve J. Madden

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    We report the fabrication of Tellurium oxide films with deposited propagation losses that are sufficiently low to allow the fabrication of high quality planar integrated optical devices. Stoichiometric low loss films were produced by reactive magnetron RF sputtering and the effect of a wide range of sputtering parameters on stoichiometry, refractive index, Raman spectra and optical loss of thin films were investigated. As deposited TeO 2 films with propagation losses below 0.1 dB/cm at 1550nm have been achieved which are therefore well suited for integrated optical applications.

    Original languageEnglish
    Title of host publicationProcessing, Properties, and Applications of Glass and Optical Materials - Proceedings of the 9th International Conference on Advances in the Fusion and Processing of Glass, AFPG9
    Pages181-186
    Number of pages6
    Publication statusPublished - 2012
    Event9th International Conference on Advances in the Fusion and Processing of Glass, AFPG9 and Symposium 15 - Structure, Properties and Photonic Applications of Glasses Held during PACRIM-9 - Cairns, QLD, Australia
    Duration: 10 Jul 201114 Jul 2011

    Publication series

    NameCeramic Transactions
    Volume231
    ISSN (Print)1042-1122

    Conference

    Conference9th International Conference on Advances in the Fusion and Processing of Glass, AFPG9 and Symposium 15 - Structure, Properties and Photonic Applications of Glasses Held during PACRIM-9
    Country/TerritoryAustralia
    CityCairns, QLD
    Period10/07/1114/07/11

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