Temperature dependence of threshold switching in NbOx thin films

Shuai Li, Xinjun Liu, Sanjoy Kumar Nandi, Dinesh Kumar Venkatachalam, Robert Glen Elliman

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    15 Citations (Scopus)

    Abstract

    The threshold switching characteristics of amorphous NbOx thin films is investigated with particular emphasis on temperature dependence of the switching characteristics. Threshold switching in this material is believed to result from a thermally-induced insulator-metal-transition (IMT) induced along a filamentary path by local Joule heating. Increasing the operating temperature is shown to lead to a reduction in the resistance of the high-resistance state and to a reduction in the threshold switching voltage. These results are discussed in relation to the transport properties of NbOx and the IMT switching model.

    Original languageEnglish
    Title of host publication2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014
    EditorsMariusz Martyniuk, Lorenzo Faraone
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages138-140
    Number of pages3
    ISBN (Electronic)9781479968671
    DOIs
    Publication statusPublished - 10 Feb 2014
    Event2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014 - Perth, Australia
    Duration: 14 Dec 201417 Dec 2014

    Publication series

    Name2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014

    Conference

    Conference2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014
    Country/TerritoryAustralia
    CityPerth
    Period14/12/1417/12/14

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