The crystallisation of deep amorphous wells in silicon produced by ion implantation

A. C.Y. Liu*, J. C. McCallum, J. Wong-Leung

*Corresponding author for this work

    Research output: Contribution to journalConference articlepeer-review

    6 Citations (Scopus)

    Abstract

    The crystallisation of deep amorphous wells is studied. These model systems are formed by high energy self implantation through a mask into silicon. The amorphised regions have an aspect ratio opposite to that employed in previous experiments. At elevated temperatures crystallisation proceeds inwards with the amorphous-phase being transformed through both lateral and vertical solid-phase epitaxy (SPE). Complementary information is obtained from performing plan view and cross-sectional transmission electron microscopy analyses. It is discovered that the recovery of the amorphous material is governed by the dynamics of solid-phase epitaxy and that unique secondary structures result from the heat treatment.

    Original languageEnglish
    Pages (from-to)164-168
    Number of pages5
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume175-177
    DOIs
    Publication statusPublished - Apr 2001
    Event12th International Conference on Ion Beam Modification of Materials - Rio Grande do Sul, Brazil
    Duration: 3 Sept 20008 Sept 2000

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