TY - JOUR
T1 - The dependence of photosensitivity on composition for thin films of Ge x As y Se1-x-y chalcogenide glasses
AU - Su, Xueqiong
AU - Wang, Rongping
AU - Luther-Davies, Barry
AU - Wang, Li
PY - 2013/11
Y1 - 2013/11
N2 - We have prepared twelve Ge-As-Se chalcogenide glass films with different chemical compositions and investigated their stability to exposure with near bandedge light. The evolution of two key parameters, the refractive index at 1550 nm and the bandgap with increasing fluence were fitted with stretched-exponential functions. While most of the films showed photo-bleaching (or photodarkening) behavior, we found that for films with a mean coordination number (MCN) around ≈2.45-2.50, neither the bandgap nor the refractive index changed upon irradiation, demonstrating that photostable glasses exist with a particular chemical composition corresponding to the strongest glass formers. Such photostable glasses are the best choice for applications in photonics.
AB - We have prepared twelve Ge-As-Se chalcogenide glass films with different chemical compositions and investigated their stability to exposure with near bandedge light. The evolution of two key parameters, the refractive index at 1550 nm and the bandgap with increasing fluence were fitted with stretched-exponential functions. While most of the films showed photo-bleaching (or photodarkening) behavior, we found that for films with a mean coordination number (MCN) around ≈2.45-2.50, neither the bandgap nor the refractive index changed upon irradiation, demonstrating that photostable glasses exist with a particular chemical composition corresponding to the strongest glass formers. Such photostable glasses are the best choice for applications in photonics.
UR - http://www.scopus.com/inward/record.url?scp=84887210717&partnerID=8YFLogxK
U2 - 10.1007/s00339-013-7585-7
DO - 10.1007/s00339-013-7585-7
M3 - Article
SN - 0947-8396
VL - 113
SP - 575
EP - 581
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
IS - 3
ER -