The evolution of bond structure in Ge33As12Se55 films upon thermal annealing

R. P. Wang*, D. Y. Choi, A. V. Rode, B. Luther-Davies

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review


    The evolution of bond structure of laser deposited Ge33As12Se55 films under various processing conditions has been investigated by X-ray photoelectron spectroscopy. It was found that a large number of Se-rich structures in the as-grown film may coalesce with As and Ge after annealing at high temperatures. In addition, both Ge and As 3d spectra show the presence of oxides. The oxygen distribution exponentially decays along the normal direction of the films regardless of different processing conditions. The critical thickness of the oxidized layer was extracted for the film annealed at various pressures and temperatures.

    Original languageEnglish
    Pages (from-to)5264-5265
    Number of pages2
    JournalJournal of Non-Crystalline Solids
    Issue number47-51
    Publication statusPublished - 1 Dec 2008


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