The thermal stability of atomic H plasma produced interface defects on Si-SiO2 stack

C. Zhang*, K. J. Weber

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceeding › Conference Paper › peer-review

    1 Citation (Scopus)

    Fingerprint

    Dive into the research topics of 'The thermal stability of atomic H plasma produced interface defects on Si-SiO2 stack'. Together they form a unique fingerprint.

    Material Science

    Engineering