Thin film deposition of Ge33As12Se55 by pulsed laser deposition and thermal evaporation: Comparison of properties

R. A. Jarvis*, R. P. Wang, A. V. Rode, C. Zha, B. Luther-Davies

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    30 Citations (Scopus)

    Abstract

    Thin films of Ge33As12Se55 were produced using two deposition techniques, ultra-fast pulsed laser deposition (UFPLD) and thermal evaporation (TE), and their properties have been investigated. The chemical composition of the UFPLD films was virtually identical to the composition of the chalcogenide glass targets, whereas the composition of films deposited by TE was significantly different from the target material. Heating of the substrate with a temperature gradient during deposition produced a gradient in composition in both UFPLD and TE films.

    Original languageEnglish
    Pages (from-to)947-949
    Number of pages3
    JournalJournal of Non-Crystalline Solids
    Volume353
    Issue number8-10
    DOIs
    Publication statusPublished - 15 Apr 2007

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