Ultrafast ablation with high-pulse-rate lasers. Part I: Theoretical considerations

E. G. Gamaly; A. V. Rode; B. Luther-Davies

doi:10.1063/1.370333

Ultrafast ablation with high-pulse-rate lasers. Part I: Theoretical considerations

E. G. Gamaly^*, A. V. Rode, B. Luther-Davies

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

196 Citations (Scopus)

Abstract

A novel ultrafast pulsed laser deposition (PLD) which eliminates film contamination was developed. Cluster or droplet contamination from the laser plumes are removed due to the low number of atoms evaporated per laser pulse. Furthermore, the nanosecond pulse duration transition to picosecond pulse duration increases the evaporation rate. The efficiency of the system is tested on the growth of amorphous carbon thin films.

Original language	English
Pages (from-to)	4213-4221
Number of pages	9
Journal	Journal of Applied Physics
Volume	85
Issue number	8 I
DOIs	https://doi.org/10.1063/1.370333
Publication status	Published - 15 Apr 1999

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@article{fb59a3082130472e9ac108d5eda04648,

title = "Ultrafast ablation with high-pulse-rate lasers. Part I: Theoretical considerations",

abstract = "A novel ultrafast pulsed laser deposition (PLD) which eliminates film contamination was developed. Cluster or droplet contamination from the laser plumes are removed due to the low number of atoms evaporated per laser pulse. Furthermore, the nanosecond pulse duration transition to picosecond pulse duration increases the evaporation rate. The efficiency of the system is tested on the growth of amorphous carbon thin films.",

author = "Gamaly, {E. G.} and Rode, {A. V.} and B. Luther-Davies",

year = "1999",

month = apr,

day = "15",

doi = "10.1063/1.370333",

language = "English",

volume = "85",

pages = "4213--4221",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "8 I",

}

TY - JOUR

T1 - Ultrafast ablation with high-pulse-rate lasers. Part I

T2 - Theoretical considerations

AU - Gamaly, E. G.

AU - Rode, A. V.

AU - Luther-Davies, B.

PY - 1999/4/15

Y1 - 1999/4/15

N2 - A novel ultrafast pulsed laser deposition (PLD) which eliminates film contamination was developed. Cluster or droplet contamination from the laser plumes are removed due to the low number of atoms evaporated per laser pulse. Furthermore, the nanosecond pulse duration transition to picosecond pulse duration increases the evaporation rate. The efficiency of the system is tested on the growth of amorphous carbon thin films.

AB - A novel ultrafast pulsed laser deposition (PLD) which eliminates film contamination was developed. Cluster or droplet contamination from the laser plumes are removed due to the low number of atoms evaporated per laser pulse. Furthermore, the nanosecond pulse duration transition to picosecond pulse duration increases the evaporation rate. The efficiency of the system is tested on the growth of amorphous carbon thin films.

UR - http://www.scopus.com/inward/record.url?scp=0032607993&partnerID=8YFLogxK

U2 - 10.1063/1.370333

DO - 10.1063/1.370333

M3 - Article

SN - 0021-8979

VL - 85

SP - 4213

EP - 4221

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8 I

ER -

Ultrafast ablation with high-pulse-rate lasers. Part I: Theoretical considerations

Abstract

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