Ultrathin Ta 2 O 5 electron-selective contacts for high efficiency InP solar cells

Parvathala Reddy Narangari, Siva Krishna Karuturi*, Yiliang Wu, Jennifer Wong-Leung, Kaushal Vora, Mykhaylo Lysevych, Yimao Wan, Hark Hoe Tan, Chennupati Jagadish, Sudha Mokkapati

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    39 Citations (Scopus)

    Abstract

    Heterojunction solar cells with transition-metal-oxide-based carrier-selective contacts have been gaining considerable research interest owing to their amenability to low-cost fabrication methods and elimination of parasitic absorption and complex semiconductor doping process. In this work, we propose tantalum oxide (Ta 2 O 5 ) as a novel electron-selective contact layer for photo-generated carrier separation in InP solar cells. We confirm the electron-selective properties of Ta 2 O 5 by investigating band energetics at the InP-Ta 2 O 5 interface using X-ray photoelectron spectroscopy. Time-resolved photoluminescence and power dependent photoluminescence reveal that the Ta 2 O 5 inter-layer also mitigates parasitic recombination at the InP/transparent conducting oxide interface. With an 8 nm Ta 2 O 5 layer deposited using an atomic layer deposition (ALD) system, we demonstrate a planar InP solar cell with an open circuit voltage, V oc , of 822 mV, a short circuit current density, J sc , of 30.1 mA cm -2 , and a fill factor of 0.77, resulting in an overall device efficiency of 19.1%. The V oc is the highest reported value to date for an InP heterojunction solar cells with carrier-selective contacts. The proposed Ta 2 O 5 material may be of interest not only for other solar cell architectures including perovskite cells and organic solar cells, but also across a wide range of optoelectronics applications including solid state emitting devices, photonic crystals, planar light wave circuits etc.

    Original languageEnglish
    Pages (from-to)7497-7505
    Number of pages9
    JournalNanoscale
    Volume11
    Issue number15
    DOIs
    Publication statusPublished - 21 Apr 2019

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