Use of MeV O+ ion implantation for isolation of GaAs/AlGaAs heterojunction bipolar transistors
- S. J. Pearton*
- , F. Ren
- , J. R. Lothian
- , T. R. Fullowan
- , A. Katz
- , P. W. Wisk
- , C. R. Abernathy
- , R. F. Kopf
- , R. G. Elliman
- , M. C. Ridgway
- , C. Jagadish
- , J. S. Williams
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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